Structural variations in nanocrystalline nickel films*
Pratibha L. Gai1,2,**, Rahul Mitra3,4, and Julia R. Weertman3
1DuPont, Central Research, Experimental Station, Wilmington,
DE 19880-0356, USA; 2University of Delaware, Department of Materials
Science and Engineering, Newark, DE 19716, USA; 3Northwestern University,
Department of Materials Science, Evanston, IL 60208, USA; 4Defence Metallurgical
Research Laboratory, Hyderabad, India
Abstract: Nanocrystalline nickel films of technological importance
have been grown on various liquid nitrogen-cooled substrates by magnetron
sputtering with and without a substrate bias. The atomic structural
and chemical studies have unveiled variations in inter- and intragranular
structures under the different process conditions. The origin and the
development of the crystallization process with and without the substrate
bias voltage have been inferred from the results.
* Special Topic Issue on the Theme
of Nanostructured Advanced Materials
**Corresponding author
Page last modified 25 October 2002.
Copyright © 2002 International Union of Pure and Applied Chemistry.
Questions or comments about IUPAC, please contact, the Secretariat.
Questions regarding the website, please contact web
manager.
