COMMISSION ON HIGH TEMPERATURE MATERIALS AND SOLID
STATE CHEMISTRY (II.3)
Number: 230/27/95
Title: Terminology of Vapor Deposition Techniques
Tash Group
Chairman: J.
O. Carlsson
Members: M.
Leskela and C.B.J.
Chatillon
Remarks: This project will be coordinated with the international
CVD community at the international CVD conferences
Completion Date: 2000 - project terminated
Objective:
The objective of this project is to establish definitions for the
terminology used in vapor deposition science and technology, and to
enhance meaningful and accurate communication within the vapor deposition
community. The project includes all variations of both chemical vapor
deposition (CVD) and physical vapor deposition (PVD). An activity
of this type has not been previously attempted for the field of vapor
deposition, and will be of great value to the international, interdisciplinary
group of people working in this area.
Progress:
The objective of this project is to establish definitions for
the terminology used in vapor deposition science and technology, and
to enhance meaningful communication within the interdisciplinary international
vapor deposition community. Both chemical and physical vapor deposition
are included. The coordinator has solicited suggestions for terms
to include from 40 scientists worldwide.
See progress report in the Minutes of the
Commission Meeting in Ljubljana, Slovenia, 12-13 June 1998 - Chem.
Int.
21(2), 54-57 (1999)
In 1999, J.O. Carlsson succeeded to Karl E. Spear as coordinator.
Last Update: 1 June 2000
Project terminated 31 dec 2001
